Sputtering target for forming thin phosphor film

Compositions – Inorganic luminescent compositions – Compositions containing halogen; e.g. – halides and oxyhalides

Reexamination Certificate

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C252S30140R, C252S30160R, C252S30160S, C204S298120, C204S298130, C428S690000, C428S917000, C106S422000, C106S424000, C106S425000, C106S426000, C106S427000

Reexamination Certificate

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07540976

ABSTRACT:
A sputtering target for fluorescent thin-film formation comprising a matrix material and a luminescent center material,wherein said matrix material has a chemical composition represented by the following formula (1), and simultaneously satisfies conditions represented by the following inequalities (2) to (5).in-line-formulae description="In-line Formulae" end="lead"?MIIvAxByOzSw  (1)in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?0.05≦v/x≦5   (2)in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?1≦y/x≦6   (3)in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?0.01≦z/(z+w)≦0.85   (4)in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?0.6≦(v+x+3y/2)/(z+w)≦1.5   (5)in-line-formulae description="In-line Formulae" end="tail"?wherein MIIrepresents one or more elements selected from the group consisting of Zn, Cd and Hg, A represents one or more elements selected from the group consisting of Mg, Ca, Sr, Ba and rare earth elements, B represents one or more elements selected from the group consisting of Al, Ga and In, and v, x, y, z and w each represent numerical values satisfying the conditions specified in the inequalities (2) to (5).

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