Sputtering target for forming magnetic thin film and fabrication

Details Sputtering target for forming magnetic thin film and fabrication Sputtering target for forming magnetic thin film and fabrication

1997-02-25

1999-09-21

Mai, Ngoclan

Specialized metallurgical processes, compositions for use therei

Compositions

Consolidated metal powder compositions

75246, C22C 3300

Patent

active

059556854

ABSTRACT:
A sputtering target for forming a magnetic thin film includes iron powder and at least one first oxide powder selected from the oxides of barium, strontium and lead. The fabrication method of a sputtering target for forming a magnetic thin film comprises the steps of molding a mixture comprising an iron-first oxide powder, or an iron-first and second oxide powder to form a compact by a cold hydrostatic pressing and of sintering the compact either in a vacuum or in a non-oxygen atmosphere. The sputtering target with a high thermal conductivity improves the deposition rate by a raised input voltage.

REFERENCES:
patent: 4217151 (1980-08-01), Mitzuno et al.
patent: 4999260 (1991-03-01), Saito et al.
patent: 5302469 (1994-04-01), Sugenoya et al.
patent: 5590385 (1996-12-01), Paik

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