Sputtering target fabrication method

Details Sputtering target fabrication method Sputtering target fabrication method

1977-12-22

1979-01-23

Lanham, C.W.

Metal working

Method of mechanical manufacture

Shaping mating parts for reassembly in different positions

204192R, 204298, 264111, 75226, 75208R, B22F 324

Patent

active

041352866

ABSTRACT:
A method for producing a cooled sputtering target assembly is described. The resultant target is also described. The material to be sputtered is provided in the form of powder which is hot isostatically pressed in a toroidal metallic container under conditions which promote compaction and bonding of the powder particles to form a fully dense material. The container is then partially removed from the target material except for a remnant around the outer surface. A cooling jacket is then fabricated and attached to the remnant of the container.

REFERENCES:
patent: 3325281 (1967-06-01), Ebhardt
patent: 3334400 (1967-08-01), Jaeger
patent: 3573003 (1971-03-01), Valyi
patent: 3803702 (1974-04-01), Bratt et al.
patent: 3939241 (1976-02-01), Powell et al.

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