Sputtering target and transparent conductive film

Details Sputtering target and transparent conductive film Sputtering target and transparent conductive film

2006-02-14

2006-02-14

Kopec, Mark (Department: 1751)

Compositions

Electrically conductive or emissive compositions

Metal compound containing

C428S922000

Reexamination Certificate

active

06998070

ABSTRACT:
A sputtering target containing a hexagonal laminar compound formed of indium oxide and zinc oxide and represented by In2O3(ZnO)mwherein m is an integer of 2 to 7 and further contains 0.01 to 1 at % of an oxide of a third element having a normal valence of 4 or more, and a transparent electrically conductive film formed therefrom. The sputtering target has a low volume resistivity and permits stable sputtering. The transparent electrically conductive film is excellent in etchability.

REFERENCES:
patent: 5972527 (1999-10-01), Kaijou et al.
patent: 6534183 (2003-03-01), Inoue
patent: 6669830 (2003-12-01), Inoue et al.
patent: 0 677 593 (1995-10-01), None
patent: 1 033 355 (2000-09-01), None
patent: 6-234565 (1994-08-01), None
patent: 6-318406 (1994-11-01), None
patent: 7-235219 (1995-09-01), None
patent: 7-335046 (1995-12-01), None
patent: 9-071860 (1997-03-01), None
English translation of JP 7-235219A.

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