Sputtering target and method of preparing the same

Details Sputtering target and method of preparing the same Sputtering target and method of preparing the same

1988-08-22

1989-12-05

Roy, Upendra

Alloys or metallic compositions

Rare earth metal base singly or in combination

148301, 420 83, 420590, 428928, G11B 724, B21C 3700

Patent

active

048851345

ABSTRACT:
Highly uniform alloy targets are prepared by melting together predetermined amounts of terbium iron and cobalt with an additional element selected from platinum, chromium, nickel, palladium, tantalum, hafnium or mixtures thereof in an argon atmosphere and casting the thus formed melt into a mold.

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patent: 4390600 (1983-06-01), Ohta et al.
patent: 4612068 (1986-09-01), Tanaka
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patent: 4645722 (1987-02-01), Katayama et al.
patent: 4670353 (1987-06-01), Sakurai
patent: 4693943 (1987-09-01), Kishi et al.
patent: 4710434 (1987-12-01), Sato et al.
patent: 4777082 (1988-10-01), Ishizaki et al.
patent: 4789606 (1988-12-01), Yamada et al.

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