Sputtering system for cathode sputtering apparatus

Details Sputtering system for cathode sputtering apparatus Sputtering system for cathode sputtering apparatus

1985-07-25

1986-10-28

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

2041921, C23C 1500

Patent

active

046197559

ABSTRACT:
Sputtering system for cathode sputtering apparatus, having a cathode base body with a target of the material to be sputtered. In the marginal part of the target an anode is disposed which is provided with at least one groove. For the solution of the problem of obtaining stable operating conditions in the lengthy coating of substrates with insulating materials and of drawing a high portion of the cathode current to the anode for a long period of time, the at least one groove opens, in accordance with the invention, on a side of the anode that is not in line of sight with the target.

REFERENCES:
patent: 3514391 (1970-05-01), Hablanian et al.
patent: 3617463 (1971-11-01), Greger et al.
patent: 3748253 (1973-07-01), Provenzano et al.
patent: 4046660 (1977-09-01), Fraser
patent: 4074140 (1978-02-01), Edenhofer
patent: 4288307 (1981-09-01), Wasa et al.

Affiliated with

Also associated with

Rating

Sputtering system for cathode sputtering apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sputtering system for cathode sputtering apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sputtering system for cathode sputtering apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1345131