Sputtering system

Details Sputtering system Sputtering system

2005-05-03

2005-05-03

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298190

Reexamination Certificate

active

06887357

ABSTRACT:
A sputtering system for depositing a thin film on a substrate includes a vacuum chamber, a support for supporting the substrate in the vacuum chamber, a target arranged to oppose the support, a fixed plate formed on a first side of the target, and a plurality of electromagnets formed on the fixed plate in a cell pattern.

REFERENCES:
patent: 5262030 (1993-11-01), Potter

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