Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1974-01-31
1979-08-28
Vertiz, O. R.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204298, C23C 1500
Patent
active
041660188
ABSTRACT:
Sputtering apparatus is described in which a magnetic field is formed adjacent a planar sputtering surface, the field comprising arching lines of flux over a closed loop erosion region on the sputtering surface.
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Airco, Inc.
Bopp E. W.
Cassett Larry R.
Draegert David A.
Langel Wayne A.
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