Sputtering method and apparatus utilizing improved ion source

Details Sputtering method and apparatus utilizing improved ion source Sputtering method and apparatus utilizing improved ion source

1980-09-15

1984-02-28

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

044340389

ABSTRACT:
Method and apparatus for sputtering an element with a magnetron plasma source where a plasma is formed between two generator cathode surfaces of the source and a generator anode disposed adjacent the plasma ejects it toward the element to be sputtered. Various applications are described including selective coating of substrates of different electrical conductivity, substrate cleaning, ion milling, retrieval of expensive or dangerous coating materials, heating with little loss in the heat source, sputtering with reactive ions, sensitization or charge neutralization, and pumping of active gases.

REFERENCES:
patent: 4162954 (1979-07-01), Morrison
patent: 4180450 (1979-12-01), Morrison
patent: 4239611 (1980-12-01), Morrison
patent: 4265729 (1981-05-01), Morrison

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