Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1981-05-18
1982-11-30
O'Keefe, Veronica
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204192E, 204298, C23C 1500
Patent
active
043614728
ABSTRACT:
Method and apparatus for sputtering an element with a magnetron plasma source where a plasma is formed between two electrostatic field defining surfaces of the source and a generator anode disposed adjacent the plasma ejects it toward the element to be sputtered. Various applications are described including selective coating of substrates of different electrical conductivity, substrate cleaning, ion milling, retrieval of expensive or dangerous coating materials, heating with little loss in the heat source, sputtering with reactive ions, sensitization or charge neutralization, and pumping of active gases.
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John A. Thornton, J. Vac. Sci. Technol. J., 15(2), Mar./Apr. 1978, pp. 171-177.
Baker Joseph J.
Ferguson Jr. Gerald J.
O'Keefe Veronica
Vac-Tec Systems, Inc.
Whitham C. Lamont
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