Sputtering device adaptable for coating heat-sensitive substrate

Details Sputtering device adaptable for coating heat-sensitive substrate Sputtering device adaptable for coating heat-sensitive substrate

1981-11-27

1984-01-17

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044262752

ABSTRACT:
Disclosed herein is means adapted for use in combination with magnetically-enhanced sputtering devices whereby said devices are rendered more useful for sputter-coating substrates susceptible to heat-induced deterioration. Said means comprises a screen-like mesh or grid member disposed intermediate the target of said device and the substrate to be coated, and in such a position that said means is also disposed across the magnetic field formed by said device. Said screen-like mesh or grid member is formed of material which is magnetizable in response to the disposition thereof across said magnetic field. Said screen-like mesh or grid member has the desirable effect of suppressing the expansion of heated plasma whereby said plasma is confined to a region proximate said target and generally away from said substrate. Also disclosed is improved anodic means for collecting fast electrons emitted from said target.

REFERENCES:
patent: 3897325 (1975-07-01), Aoshima et al.
patent: 4022947 (1977-05-01), Grubb et al.
patent: 4046660 (1977-09-01), Fraser

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