Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2011-07-19
2011-07-19
Neckel, Alexa D (Department: 1723)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298180, C204S298200, C204S298230
Reexamination Certificate
active
07981263
ABSTRACT:
A sputtering apparatus includes a susceptor having a substrate and a plurality of target devices facing the substrate and substantially parallel to each other, each target device being rotatable.
REFERENCES:
patent: 6800183 (2004-10-01), Takahashi
patent: 6964731 (2005-11-01), Krisko et al.
patent: 2004/0231973 (2004-11-01), Sato et al.
patent: 1572900 (2005-02-01), None
patent: 11-209872 (1999-08-01), None
patent: 2004-346387 (2004-12-01), None
Yoo Hwan Kyu
Yoon Hyuk Sang
Yun Byung Han
Band Michael
LG Display Co. Ltd.
McKenna Long & Aldridge LLP
Neckel Alexa D
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