Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-04-14
1995-05-23
Breneman, R. Bruce
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429816, C23C 1435
Patent
active
054178339
ABSTRACT:
A magnetron sputter apparatus is disclosed which includes a rotatable generally heart-shaped, closed-loop magnet array behind the target and in front of a pair of separately driven stationary electromagnets. The apparatus is optimized to produce a sputtered film on a planar substrate having desired film characteristics such as uniformity of thickness, good step coverage, and good via filling and efficient utilization of the target. The shape of the generally heart-shaped array includes a flattened tip forming an arc of a circle centered on the axis of rotation and concave cusps in the lobes of the heart-shape. The electromagnets are used to increase target utilization at its center and to compensate for the change in shape of the target and distance from the target to the substrate with depletion.
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patent: 4891560 (1990-01-01), Okumura et al.
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patent: 5188717 (1993-02-01), Broadbent et al.
patent: 5262030 (1993-11-01), Potter
Harra David J.
Hartsough Larry D.
Breneman R. Bruce
Fisher Gerald M.
McDonald Rodney
Varian Associates Inc.
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