Sputtering apparatus for production of thin films of magnetic ma

Details Sputtering apparatus for production of thin films of magnetic ma Sputtering apparatus for production of thin films of magnetic ma

1988-12-09

1990-03-27

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 2041922, C23C 1450, C23C 1456

Patent

active

049118153

ABSTRACT:
A magnetic film deposition chamber having Helmholtz coils and a preliminary chamber are connected through a gate valve. Two magnetic plates are fixed to the magnetic film deposition chamber near the both ends thereof. Substrates overlying apertures of a substrate holder are moved by a conveyer together with the substrate holder. The conveyor moves from the preliminary chamber to the film deposition chamber through the gate valve. The substrates then positioned over and between the magnetic plates and are located above the target in the magnetic film deposition chamber.

REFERENCES:
patent: 4673482 (1987-06-01), Setoyama et al.

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