Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1980-09-08
1981-09-22
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20492R, C23C 1500
Patent
active
042908779
ABSTRACT:
A conventional sputtering chamber is modified to include two elongated hollow tubes which accommodate an elongated workpiece in the form of a tube or strip, of lesser diameter, during a sputter-coating operation. During the sputtering operation, the workpiece is simultaneously rotated and moved back and forth beneath at least one sputtering target to receive a uniform coating thereon.
REFERENCES:
patent: 3884787 (1975-05-01), Kuehnle
patent: 3884793 (1975-05-01), Penfold et al.
patent: 3901784 (1975-08-01), Quinn et al.
patent: 3945903 (1976-05-01), Svendor et al.
patent: 4046712 (1977-09-01), Cairns et al.
patent: 4128466 (1978-12-01), Harding et al.
patent: 4151064 (1979-04-01), Kuehnle
patent: 4194962 (1980-05-01), Chambers et al.
patent: 4252865 (1981-02-01), Gilbert et al.
G.L. Harding et al. "The DC Sputter Coating of Solar-Selective _Surfaces Onto Tubes", J. Vac. Sci. Technol., vol. 13, pp.1073-1075 (1976).
Brown William S.
Gardiner Donald A.
The United States of America as represented by the Secretary of
Weisstuch Aaron
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