Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2010-09-27
2011-11-08
Neckel, Alexa (Department: 1723)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C118S728000
Reexamination Certificate
active
08052853
ABSTRACT:
A sputtering apparatus includes a container; a plate for supporting the container; a first attachment for attaching the container to the plate; and a second attachment for less tightly attaching the container to the plate than through the first attachment.
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Office Action issued in Korean Application No. 10-2005-0055521.
Choi Jaehoon
Jung Kagkyu
Kim Jaekwang
Kim Kyoungshik
Lee Seunglyul
Band Michael
LG Display Co. Ltd.
Morgan & Lewis & Bockius, LLP
Neckel Alexa
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