Sputtering apparatus

Details Sputtering apparatus Sputtering apparatus

1975-12-17

1977-03-29

Mack, John H.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

040147797

ABSTRACT:
A sputtering machine which has a rotary anode that is insulated from its supporting structure and maintained at a voltage differing from that of the supporting structure. Means are provided for controlling the temperature of the surface of the anode through circulating heat exchange liquid.

REFERENCES:
patent: 3272175 (1966-09-01), Lorenz et al.
patent: 3818982 (1974-06-01), Wagner

Affiliated with

Also associated with

Rating

Sputtering apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sputtering apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sputtering apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-547568