Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2007-07-17
2007-07-17
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298060
Reexamination Certificate
active
10651613
ABSTRACT:
A sputtering apparatus is provided with a DC power supply1, an inverter2that converts DC voltage to AC voltage, a matching circuit10that transforms the AC voltage, a rectifier4that converts the transformed AC voltage to direct current, and a sputtering load6. The matching circuit10has a transformer3that transforms AC voltage from the inverter2, inductance L provided in series with at least one of the primary winding31and secondary winding32, and a condenser C provided in parallel with at least one of the primary winding31and secondary winding32through inductance L.
REFERENCES:
patent: 4560831 (1985-12-01), Bast et al.
patent: 6130831 (2000-10-01), Matsunaga
patent: 6760234 (2004-07-01), Yuzurihara et al.
Ikoshi Hiroyuki
Kobayashi Toshio
Komatsu Kiyoshi
Masuda Tadashi
Matsumoto Tetsuya
Kolisch & Hartwell, P.C.
McDonald Rodney G.
Origin Electric Company Limited
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