Sputtering apparatus

Details Sputtering apparatus Sputtering apparatus

1984-11-21

1985-10-15

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

045472793

ABSTRACT:
A magnetron type sputter apparatus utilizing an orthogonal electromagnetic field, with the apparatus being adapted for forming an electrode wiring of a semiconductor device. The apparatus includes a target having a shape adapted to prevent a bumping of a target material from an end part of the target so that a temperature rise and damage of the semiconductor device attributed to electron bombardment can be prevented and the lifetime of the target can be prolonged.

REFERENCES:
patent: 4060470 (1977-11-01), Clarke
patent: 4169031 (1979-09-01), Brors
patent: 4219397 (1980-08-01), Clarke
patent: 4401539 (1983-08-01), Abe et al.
patent: 4414086 (1983-11-01), Lamont
patent: 4422896 (1983-12-01), Class et al.
patent: 4428816 (1984-01-01), Class et al.
patent: 4457825 (1984-07-01), Lamont

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