Sputtering apparatus

Details Sputtering apparatus Sputtering apparatus

1990-04-04

1991-08-06

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, C23C 1434

Patent

active

050375210

ABSTRACT:
A sputtering apparatus for producing a thin film with use of a laser beam is disclosed. The sputtering apparatus comprises a vacuum chamber, a target and a substrate disposed inside the vacuum chamber, a laser beam-projecting unit, a beam-shape adjusting unit, an optical scanning unit, and a light-converging unit. The optical scanning unit comprises a mirror which rotates to allow the laser beam to scan the target, and the angular speed thereof is regulated so as to move the spot of the laser beam at a fixed speed on the target. The beam-shape adjusting unit or the light-converging unit moves along its optical axis in synchronization with the movement of the mirror of the optical scanning unit, thereby keeping the spot of the laser beam at a predetermined size.

REFERENCES:
patent: 4664769 (1987-05-01), Cuomo et al.
patent: 4664940 (1987-05-01), Bensoussan et al.
patent: 4814259 (1989-03-01), Newman et al.
patent: 4873413 (1989-10-01), Vesugi et al.
patent: 4892751 (1990-01-01), Miyake et al.

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