Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1989-12-19
1991-06-25
Nguyen, Nam X.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429819, 2042982, 20429823, 2041922, C23C 1434
Patent
active
050264702
ABSTRACT:
A sputtering apparatus in which the electrode for supporting the substrates upon which thin magnetic films are to be deposited has a polygon-shaped planar coil adjacent to a surface so that the coil can be energized to produce a uniform magnetic field at the surface of the substrates which is oriented normal to the polygon faces of the coil. This apparatus produces uniform easy axis of the thin magnetic films deposited on the substrates during relative motion between the substrates and the target electrode.
REFERENCES:
patent: 4094764 (1978-06-01), Boucher et al.
patent: 4247383 (1981-01-01), Greve et al.
patent: 4673482 (1987-06-01), Setoyama et al.
patent: 4849250 (1989-07-01), Dee et al.
Bonyhard Peter I.
Cheng David C.
Glover William J.
Hendrix Howard A.
Ward Ernest S.
International Business Machines
Nguyen Nam X.
Schmid, Jr. Otto
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