Sputtering apparatus

Details Sputtering apparatus Sputtering apparatus

1982-02-08

1983-07-19

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192C, 204192R, C23C 1500

Patent

active

043942458

ABSTRACT:
Herein disclosed is a sputtering apparatus in which a substrate electrode has its electrode surface plate made of a soft magnetic material. The thickness distribution of the film deposited is made uniform by the use of the sputtering apparatus.

REFERENCES:
patent: 3878085 (1975-04-01), Corbani
patent: 4094764 (1978-06-01), Boucher et al.
patent: 4169031 (1979-09-01), Brors
Meckel et al., Research Disclosure, Oct. 1979, pp. 537-540.

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