Sputtering apparatus

Details Sputtering apparatus Sputtering apparatus

1982-08-24

1983-10-25

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044117639

ABSTRACT:
A sputtering apparatus for coating by the use of a target cathode within a vacuum chamber an article to be treated which is held on an article holding means within the vacuum chamber. The target cathode is of a tubular skeleton structure and is disposed so as to surround the article holding means.

REFERENCES:
patent: 3576729 (1971-04-01), Sigournay
patent: 3598710 (1971-08-01), Davidse
patent: 3787312 (1974-01-01), Wagner et al.
patent: 4107350 (1978-08-01), Berg et al.
patent: 4128466 (1978-12-01), Harding et al.
patent: 4151059 (1979-04-01), Kuehnle
patent: 4178877 (1979-12-01), Kudo
patent: 4252626 (1981-02-01), Wright et al.
patent: 4362632 (1982-12-01), Jacobs
Putner et al, Electronics Equipment News, Apr.-Jun. 1968, pp. 2-19.

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