Sputtering apparatus

Details Sputtering apparatus Sputtering apparatus

1989-12-14

1992-01-21

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

2041921, 20419213, 20429807, 20429809, 20429802, C23C 1434

Patent

active

050825453

ABSTRACT:
A sputtering apparatus to be used in reactive sputtering which mixes a reactive gas into a discharge gas so as to form chemical compound thin membranes.
A heating means is provided for heating the target. Light such as infrared rays or the like, and laser beams are ideal as the heating means. A thermometer for applying light is preferable to measure the temperature of at least one portion of the target for controlling the heating condition of the target. The composition of the thin membrane to be formed by the reactive sputtering can may be made constant.

REFERENCES:
patent: 3472751 (1969-10-01), King
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patent: 4033843 (1977-07-01), Krikorian et al.
patent: 4046666 (1977-09-01), McClanahan et al.
patent: 4407708 (1983-10-01), Landau
patent: 4487675 (1984-12-01), Meckel
patent: 4664769 (1987-05-01), Cuomo et al.
patent: 4892751 (1990-01-01), Miyake et al.
patent: 4923585 (1990-05-01), Krauss et al.
patent: 4933063 (1990-06-01), Katsura et al.
patent: 4933065 (1990-06-01), Seiler

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