Sputtering apparatus

Details Sputtering apparatus Sputtering apparatus

1986-10-24

1988-01-05

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419215, 20419223, 20419225, C23C 1400

Patent

active

047174625

ABSTRACT:
A sputtering apparatus comprising an intermediate electrode having a plurality of openings disposed between a cathode and a substrate electrode.
The directionality of the particles which are liberated from a target by the collision of ions against the target is made remarkably uniform by the presence of the intermediate electrode, and thus a thin film having a superior step coverage can be deposited on the substrate placed on the substrate electrode.

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patent: 4158589 (1979-06-01), Keller et al.
patent: 4318796 (1982-03-01), Nishiyama et al.
patent: 4395323 (1983-07-01), Denton et al.
patent: 4426274 (1984-01-01), Ephrath
patent: 4540466 (1985-09-01), Nishizawa
patent: 4572759 (1986-02-01), Benzing
patent: 4579618 (1986-04-01), Celestino et al.
patent: 4581118 (1986-04-01), Class et al.
patent: 4624767 (1986-11-01), Obinata

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