Sputtered particle flow source for isotopically selective ioniza

Details Sputtered particle flow source for isotopically selective ioniza Sputtered particle flow source for isotopically selective ioniza

1978-03-13

1981-04-28

Anderson, Bruce C.

Radiant energy

Ion generation

Field ionization type

250281, H01J 3934

Patent

active

042648190

ABSTRACT:
Method and apparatus for sputtering particles of plural isotope types to produce a particle flow of the plural isotope types into a region where laser radiation is generated to produce isotopically selective ionization of at least one isotope type in the sputtered particle flow. Separate collection of the ionized particles is accomplished through application of a magnetic field in the region of ionization and beyond.

REFERENCES:
patent: 3464026 (1969-08-01), Woodbery et al.
patent: 3504297 (1970-03-01), Labuda
patent: 3558877 (1971-01-01), Pressman
patent: 4035638 (1977-07-01), Szoke et al.

Affiliated with

Also associated with

Rating

Sputtered particle flow source for isotopically selective ioniza does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sputtered particle flow source for isotopically selective ioniza, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sputtered particle flow source for isotopically selective ioniza will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-865932