Sputtered particle flow source for isotopically selective ioniza

Details Sputtered particle flow source for isotopically selective ioniza Sputtered particle flow source for isotopically selective ioniza

1973-12-27

1976-05-04

Lawrence, James W.

Radiant energy

Ion generation

Field ionization type

250281, H01J 3934

Patent

active

039550907

ABSTRACT:
Method and apparatus for sputtering particles of plural isotope types to produce a particle flow of the plural isotope types into a region where laser radiation is generated to produce isotopically selective ionization of at least one isotope type in the sputtered particle flow. Separate collection of the ionized particles is accomplished through application of a magnetic field in the region of ionization and beyond.

REFERENCES:
patent: 3247373 (1966-04-01), Herzog et al.
patent: 3392280 (1968-07-01), Friedman et al.
patent: 3660655 (1972-05-01), Wardell
patent: 3772519 (1973-11-01), Levy et al.
"Mass-Spectrometric Micro-Surface Analysis," Herzog, 3-63, Geophysics Corp. of America Publication, pp. 1-4, 250-309.

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