Sputtered dielectric thin films

Details Sputtered dielectric thin films Sputtered dielectric thin films

1974-12-09

1976-06-08

Tung, T.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, 317258, 350 96WG, 350164, 350311, C23C 1500, G02B 514, G02B 528, H01G 408

Patent

active

039620620

ABSTRACT:
Sputtered thin films, particularly of tantalum and niobium, are prepared having predetermined optical and dielectric properties by controlling the flow rate of O.sub.2 in relation to the flow rate of N.sub.2. By controllably varying the ratio, differing characteristics can be obtained. Thus a stepwise or a continuous variation in refractive index can be obtained. Films show low optical losses and birefringent properties, and are particularly suitable for optical waveguides, capacitors and filters.

REFERENCES:
patent: 3558461 (1971-01-01), Parisi
patent: 3607384 (1971-09-01), Banks
patent: 3607697 (1971-09-01), Shirn et al.
W. D. Westwood, "Analysis of an Ar-O.sub.2 -N.sub.2 Discharge for Tantalum Sputtering," J. Voc. Sci. Tech. vol. 11, No. 1, pp. 175-178, Jan./Feb. (1974).
Chem. Abstr. vol. 81, 55153e (1974).
M. Croset et al., "Study of Competitive Diffusion at 525.degree.C of N.sub.2 and O.sub.2 in Sputtered B-Ta Films," J. Voc. Sci. Tech., vol. 19, No. 1, pp. 165-168 (1972).

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