Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1980-05-16
1984-07-03
Kaplan, G. L.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204192R, C23C 1500
Patent
active
044578253
ABSTRACT:
An optimized annular sputter target for use in a sputter coating source has a cross sectional shape comprising a front surface from which material is to be sputtered, an outer rim and an inner rim, a back surface generally opposite said sputter surface, said outer rim having a first portion intersecting said back surface and a second portion intersecting said front sputter surface, said second portion extends outwardly from said first portion, said outer rim is substantially longer in a direction parallel to the axis of said annular target than is said inner rim, and said inner rim slopes outwardly from its intersection with said front sputter surface.
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Cole Stanley Z.
Herbert Leon F.
Kaplan G. L.
Leader William T.
Varian Associates Inc.
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