Sputter target

Details Sputter target Sputter target

1979-08-02

1980-06-24

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192C, 204298, 428627, 428662, 428672, 428925, 428926, C23C 1500

Patent

active

042093759

ABSTRACT:
The disclosure relates to an improved sputter target for use in the deposition of hard coatings. An exemplary target is given wherein titanium diboride is brazed to a tantalum backing plate using a gold-palladium-nickel braze alloy.

REFERENCES:
patent: 3160480 (1964-12-01), Alliegro
patent: 3487536 (1970-01-01), Goldstein
patent: 3802078 (1974-04-01), Denes
J. van Esdonk and J. F. M. Janssen, Joining a Sputtering Target and a Backing Plate, Research/Development vol. 26, No. 1 (Jan., 1975) pp. 41-44.

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