Sputter ion pump

Details Sputter ion pump Sputter ion pump

2006-06-28

2010-10-26

Kramer, Devon C (Department: 3746)

Pumps

Electrical or getter type

C417S049000

Reexamination Certificate

active

07819633

ABSTRACT:
A sputter ion pump includes one vacuum chamber, two parallel anode poles and one cold cathode electron emitter. The vacuum chamber includes at least one aperture located in an outer wall thereof. The two parallel anode poles are positioned in the vacuum chamber and arranged in a symmetrical configuration about a center axis of the vacuum chamber. The cold cathode electron emission device is located on or proximate the outer wall of the vacuum chamber and faces a corresponding aperture. The cold cathode electron emission device is thus configured for injecting electrons through the corresponding aperture and into the vacuum chamber. The sputter ion pump produces a saddle-shaped electrostatic field and is free of a magnetic field. The sputter ion pump has a simplified structure and a low power consumption.

REFERENCES:
patent: 3169693 (1965-02-01), Herzog
patent: 3217974 (1965-11-01), Knauer
patent: 3719852 (1973-03-01), Goody
patent: 4334829 (1982-06-01), Harbaugh
patent: 5655886 (1997-08-01), Alderson
patent: 6111252 (2000-08-01), Pierrejean
patent: 7149085 (2006-12-01), Chebiam et al.
patent: 2005/0249618 (2005-11-01), Nonaka et al.

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