Sputter deposition of lithium phosphorous oxynitride material

Details Sputter deposition of lithium phosphorous oxynitride material Sputter deposition of lithium phosphorous oxynitride material

2005-03-08

2005-03-08

Ryan, Patrick (Department: 1745)

Metal working

Method of mechanical manufacture

Electrical device making

C204S192150, C204S298160, C204S298190

Reexamination Certificate

active

06863699

ABSTRACT:
A method of depositing lithium phosphorus oxynitride on a substrate, the method comprising loading a substrate into a vacuum chamber having a target comprising lithium phosphate, introducing a process gas comprising nitrogen into the chamber and maintaining the gas at a pressure of less than about 15 mTorr; and forming a plasma of the process gas in the chamber to deposit lithium phosphorous oxynitride on the substrate.

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