Sputter coating with charged particle flux control

Details Sputter coating with charged particle flux control Sputter coating with charged particle flux control

1975-12-29

1977-09-06

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192S, 204192P, 204192D, 204298, C23C 1500

Patent

active

040466604

ABSTRACT:
Substrate heating during sputter coating, due to charged particles, is controlled by the use of an auxiliary magnet in the vicinity of the substrate. The magnet is arranged to either increase this charge particle flux, in situations in which additional heating is desired, or reducing this charge particle flux in situations in which heating is detrimental (e.g., the sputter coating of heat sensitive substrates such as polymer films).

REFERENCES:
patent: 2239642 (1941-04-01), Burkhardt et al.
patent: 3616450 (1971-10-01), Clarke
patent: 3669860 (1972-06-01), Knowles et al.
patent: 3711398 (1973-01-01), Clarke
patent: 3884793 (1975-05-01), Penfold et al.
patent: 3897325 (1975-07-01), Aoshima et al.
patent: 3956093 (1976-05-01), McLeod

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