Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1974-01-23
1978-06-13
Vertiz, O. R.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
C23C 1500
Patent
active
040947637
ABSTRACT:
Transparent, electroconductive articles produced by cathode sputtering on refractory substrates, a metal from the group of elements having an atomic number from 48 to 51 and mixtures thereof, and preferably a controlled proportion of tin to indium, in a low pressure atmosphere containing a controlled amount of oxygen at a controlled substrate temperature within a temperature range of 400.degree. F. to a temperature at which the substrate becomes distorted or detrimentally affected, usually at or above 600.degree. F.
REFERENCES:
patent: 3414503 (1968-12-01), Brichard
patent: 3451912 (1969-06-01), D'Heurle et al.
patent: 3531335 (1970-09-01), Heyerdahl et al.
patent: 3630873 (1971-12-01), Moore et al.
patent: 3655545 (1972-04-01), Gillery et al.
patent: 3907660 (1975-09-01), Gillery
"Apparatus for the Controlled Deposition of Optical Film Systems" by Steckelmacher et al., Vacuum, Feb. 2, 1959, pp. 171-182.
"Deposition Measurements in a Cathode Sputtering System " by Schaible et al., IBM Technical Disclosure Bulletin, vol. 6, No. 1, Jun. 1963, pp. 112-113.
Gillery Frank H.
Kubichan Robert E.
Pressau Jean P.
Langel Wayne A.
Mates Edward I.
Pollock E. Kears
PPG Industries Inc.
Vertiz O. R.
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