Sprout inhibition compositions comprising chlorpropham and subst

Details Sprout inhibition compositions comprising chlorpropham and subst Sprout inhibition compositions comprising chlorpropham and subst

1996-05-24

1997-04-22

Clardy, S. Mark

Plant protecting and regulating compositions

Plant growth regulating compositions

Plural active ingredients

504304, A01N 4720, A01N 2700

Patent

active

056229127

ABSTRACT:
Compositions which include a mixture of CIPC and at least one substituted naphthalene are disclosed. The compositions of the present invention are adapted for inhibiting sprout growth in tubers. When so used, the preferred substituted naphthalene in the compositions of the present invention are dimethylnaphthalene (DMN) and diisopropylnaphthalene (DIPN). A method of applying a CIPC
aphthalene mixture is also disclosed. In a preferred embodiment of the method, tubers to be placed in storage are treated with a composition of CIPC and a substituted naphthalene utilizing thermal fogging techniques, with the average effective residue of CIPC on the tubers of from approximately 21 ppm to 2.5 ppm. In the preferred embodiment, the weight ratio of average effective residue of CIPC to the substituted naphthalene is from approximately 1:1 to 1:4. In a most preferred embodiment, a composition including CIPC and either DIPN or DMN is applied to tubers utilizing thermal fogging techniques, to obtain an average effective residue on the outer surface of the tubers of approximately 14 ppm CIPC and 14 ppm of the DIPN or DMN.

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"Clean Crop Sprout NIP.RTM. 7A Sprout Nip," 1994 Specimen Label and Material Safety Data Sheet, Platte Chemical Co., 50 S. Main Street, Fremont, NE 68025-5697.
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