Coating processes – Spraying – Moving the base
Patent
1982-05-24
1983-11-08
Beck, Shrive P.
Coating processes
Spraying
Moving the base
118323, 118326, 118DIG7, 239296, 239299, 98115SB, B05D 102, B05B 104
Patent
active
044142528
ABSTRACT:
An improved spray booth is provided for use in forming high quality thin films by controlling the spray parameters related to film formation. A spray nozzle design is selected which permits control of the spray footprint on a heated substrate. A projected atomized liquid is formed to the selected spray configuration by directing spray cones of air toward the atomized liquid. Dwell time of the spray material adjacent the hot substrate is then controlled by controlling the velocity of airflow within the spray chamber and adjacent the substrate. To promote a gas phase reaction, a roof section is provided with reduced airflow wherein sufficient dwell time is provided for the vapor reaction to occur. Where a liquid phase reaction is provided, high velocity airflow is maintained to promptly remove reaction products and spray material which has not reached the surface after a selected time period. The spray booth is designed for frequent cleaning by providing separately removable sections where the frequency of cleaning may be varied as a function of the accumulated condensate. Thus, regions of the spray booth in contact with the sprayed solution may be removed without removing the entire spray booth. Particular uses employing the particular design principles include application of a film of SnO.sub.x which is highly transparent and electrically conductive and thin films of CdS suitable for use in forming large area photovoltaic panels.
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Beck Shrive P.
Photon Power, Inc.
Wilson Ray G.
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