Coating apparatus – Projection or spray type – Rotating work
Patent
1998-11-12
2000-10-31
Beck, Shrive
Coating apparatus
Projection or spray type
Rotating work
118 52, 118315, 427240, 427425, B05B 1304
Patent
active
061396362
ABSTRACT:
A spray coating device for coating a rotating wafer according to the invention is disclosed. The spray coating device comprises a spray head having a plurality of spray holes which are located on one end thereof with more in number on both sides than on the center of the end for uniformly spraying a chemical liquid on the rotated wafer. Since spray holes are more in number on the both sides than on the center of the end, the rotated wafer can be uniformly spray coated with the chemical liquid even though several spray holes are congested.
REFERENCES:
patent: 5415753 (1995-05-01), Hurwitt et al.
patent: 5571560 (1996-11-01), Lin
patent: 5759614 (1998-06-01), Tomoeda et al.
patent: 5962070 (1999-10-01), Mitsuhashi et al.
patent: 5972426 (1999-10-01), Kutsuzawa et al.
Hsu Hsien-Jung
Huang Kuo-Feng
Wang Kuo-Chen
Yang Ming-Che
Beck Shrive
Calcagni Jennifer
United Microelectronics Corp.
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