Measuring and testing – Surface and cutting edge testing – Roughness
Reexamination Certificate
2005-07-19
2005-07-19
Raevis, Robert (Department: 2856)
Measuring and testing
Surface and cutting edge testing
Roughness
Reexamination Certificate
active
06918286
ABSTRACT:
A silicon nitride film is formed all over the surface of a cantilever prepared as including a support portion made by processing single-crystal silicon wafer, a lever portion extended from the support portion, formed with a controlled thickness from single-crystal silicon, and a probe portion made of single-crystal silicon disposed toward the free end of the lever portion with having its probe axis perpendicular to the lever portion, so as to have a greater film thickness on the side face of the probe portion toward the free end of the lever portion, thereby constructing SPM cantilever of configuration where the terminal end portion of the probe portion is tilted toward the free end by a certain angle θ with respect to the probe axis. The SPM cantilever thereby can be achieved as capable of measuring surface conditions always at high resolution correspondingly to measuring condition or sample shape.
REFERENCES:
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patent: 5345816 (1994-09-01), Clabes et al.
patent: 6011261 (2000-01-01), Ikeda et al.
patent: 6121771 (2000-09-01), Moser
patent: 6457350 (2002-10-01), Mitchell
patent: 6528785 (2003-03-01), Nakayama et al.
patent: 2000-275260 (2000-10-01), None
Kitazawa Masashi
Shiotani Koichi
Olympus Optical Co,. Ltd.
Raevis Robert
Westerman Hattori Daniels & Adrian LLP
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