Spiral hollow cathode

Details Spiral hollow cathode Spiral hollow cathode

1989-05-24

1991-04-16

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

With treating means

31323141, 31511121, 31511191, 427 39, C23C 1650

Patent

active

050073737

ABSTRACT:
A spiral hollow cathode having adjacent layers which are equivalent to a two-dimensional array of small hollow cathodes. The cathode may be used for producing large area electron beams and for plasma-assisted deposition of films such as diamond over a large area without requiring heating external to the plasma itself.

REFERENCES:
patent: 4087720 (1978-05-01), Takagi
patent: 4339691 (1982-07-01), Morimiya et al.
patent: 4407712 (1983-10-01), Henshaw et al.
patent: 4529571 (1985-07-01), Bacon et al.
patent: 4679219 (1987-07-01), Ozaki
patent: 4735633 (1988-04-01), Chiu
patent: 4886969 (1989-12-01), Knauer
Bunshah, Roitan F. et al., Deposition Technologies for Films and Coatings, Noyes, New Jersey (1982), pp. 106-108.
Singh, et al., Hollow Cathode Plasma Assisted Chemical Vapor Deposition of Diamond, Applied Physics Letters 52 (20), pp. 1658-1660 (May 16, 1988).

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