Spin-on glass for use in semiconductor processing

Details Spin-on glass for use in semiconductor processing Spin-on glass for use in semiconductor processing

1987-10-22

1989-01-17

Lieberman, Paul

Compositions: coating or plastic

Coating or plastic compositions

Silicon containing other than solely as silicon dioxide or...

10628713, 10628712, C09K 300

Patent

active

047986298

ABSTRACT:
A spin-on glass consisting of, by volume: 1.0 parts tetraethoxysilane (TEOS, also known as tetraethylorthosilicate), methyltriethoxysilane, and dimethyldiethoxysilane in a 2/1/1 ratio; 1.1 parts ethanol (EtOH, also known as ethyl alcohol); 0.0002 parts hydrochloric acid (HCl); and 0.26 parts water (H.sub.2 O).

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patent: 4518727 (1985-05-01), Traver
patent: 4605446 (1986-08-01), Isozaki
Journal of Vacuum Science & Technology B, vol. 3, No. 5, Sep./Oct. 1985, pp. 1352-1356.

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