Spin-on glass composition

Details Spin-on glass composition Spin-on glass composition

1991-07-18

1992-10-06

Morris, Theodore

Compositions: coating or plastic

Coating or plastic compositions

Silicon containing other than solely as silicon dioxide or...

10628711, 10628714, 10628716, C09D18306

Patent

active

051528347

ABSTRACT:
There is disclosed spin-on glass compositions, preferably for use as coating layers on substrates such as semiconductor silicon wafers, which comprise a solution of a crosslinked polyorganosiloxane having a silane adhesion promoter incorporated therein preferably with a glycoether, glycolether acetate or similar solvent. Also provided are methods for preparing these spin-on glass compositions from polyorganosiloxanes preferably having at least 30 wt. % carbon. These spin-on glass compositions (a) provide layers with improved resistance to O.sub.2 concentration variations during etching and are stable at temperatures of up to 500.degree. C. without decomposition, (b) have an extended shelf-life of more than one year, and (c) can fill small spaces with high aspect ratios with low shrinkage and low stress.

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Morimoto and Grant; "Manufacturable and Reliable Spin-On Glass Planarization Process for 1 .mu.m CMOS Double Layer Metal Technology" pp. 411-418.

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