Spin drying apparatus

Details Spin drying apparatus Spin drying apparatus

1986-05-16

1987-03-24

Makay, Albert J.

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

34 8, 34239, 294115, F26B 1108

Patent

active

046514406

ABSTRACT:
A spin drying apparatus for drying semiconductor wafers wherein the wafers are contacted only at the edge thereof by a plurality of radially extending arms and wherein means is provided for preventing the generation of turbulent air flow by the fan-like effect of the rotation of the arms during the spin drying step and the recontamination of already cleaned and dried wafer surfaces by contaminants stirred up by the operation of the spin drying apparatus itself.

REFERENCES:
patent: 3152875 (1964-10-01), Davis et al.
patent: 4134215 (1979-01-01), Kuhl
patent: 4313266 (1982-02-01), Tam
IBM Technical Disclosure Bulletin vol. 18, No. 6, pp. 1979-1980, Nov. 1975.

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