Spin drier for semiconductor material

Details Spin drier for semiconductor material Spin drier for semiconductor material

1984-01-09

1985-07-02

Schwartz, Larry I.

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

34 8, 34 69, F26B 1732

Patent

active

045259380

ABSTRACT:
A spin drier including a casing and a rotor equipped with at least one holder for a carrier, which is adapted to enclose a semiconductor material such as a silicon wafer therein, and embraced in the casing so that the semiconductor material placed on the rotor is dried by a gas stream which has been introduced through an intake port provided above the rotor, passes through the rotor and is to be exhausted through an exhaust port formed through a circumferential wall of the casing. The rotor is provided with at least three guide members on the outer section thereof, and each guide member includes a substantially vertically disposed curved surface with its convex side faced inwardly. The described holder is positioned between two guide members, to thereby guide the above described gas flow and thus prevent water, dusts and/or stains located on the bottom wall and circumferential wall of the casing from flowing back onto the semiconductor materials.

REFERENCES:
patent: 4087924 (1978-05-01), Fujimoro
patent: 4445281 (1984-05-01), Aigoo

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