Spin coating process for prevention of edge buildup

Coating processes – Electrical product produced – Condenser or capacitor

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118 52, 118506, 427240, B05D 512, B05C 1302

Patent

active

040680193

ABSTRACT:
A spin coating process produces a constant film thickness across a planar substrate by placing a frame around the substrate boundary to act as an auxiliary surface to allow a continuous film of the fluid to be spin coated. The auxiliary surface is elevated with respect to the plane of the substrate surface.

REFERENCES:
patent: 3323491 (1967-06-01), Granick
IBM Technical Disclosure Bulletin, Evaporation Water Carrier, T.A. Gunter et al., vol. 14, No. 12, May 1972, pp.3693-3694.
IBM Technical Disclosure Bulletin, Spin Coating Photoresist, P.W. Reed et al., vol. 16, No. 5, Oct. 1973, pp. 1535-1536.
IBM Technical Disclosure Bulletin, Controlled Gap Photoresist Spinning Process, J.E. Holihan, Sr. and L.Landstein, vol. 17, No. 11, Apr. 1975, p. 3281.

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