Spin coating process

Details Spin coating process Spin coating process

1979-09-19

1981-05-12

Smith, Ronald H.

Coating processes

Centrifugal force utilized

427425, 430640, 430935, B05D 510, B05D 140

Patent

active

042672120

ABSTRACT:
A process for spin coating a substrate such as a semi-conductor wafer uniformly with a coating solution such as a photographic emulsion by rotating the substrate at a first speed while simultaneously applying the coating solution at a radially moving position. Once the substrate has been initially covered, the speed of rotation of the substrate is increased and rotation continues until a uniform coating is obtained.

REFERENCES:
patent: 4075974 (1978-02-01), Plows et al.
patent: 4113897 (1978-09-01), Nosker
patent: 4124411 (1978-11-01), Meuleman et al.
patent: 4175145 (1979-11-01), Fechter
Massey et al., "Glass Slurry Deposition", IBM Technical Disclosure Bulletin, vol. 14, No. 10, Mar. 1972.

Affiliated with

Also associated with

Rating

Spin coating process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Spin coating process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Spin coating process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2046919