Spin-coating procedure

Coating processes – Centrifugal force utilized

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4273455, 437231, B05D 312

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active

047419261

ABSTRACT:
Nonuniform topographical features on a substrate are effectively coated for lithographic processing by spin-coating with a suitable resin material in a dual spin cycle. The coating material is initially spin-coated onto the substrate at not less than 4000 rpm, preferably from 6000 to 8000 rpm, until build-up of the coating is detectable on a side wall of a topographical feature facing the centrifugal center of the spinning substrate. The spin speed is immediately reduced to less than 4000 rpm, preferably from about 1000 to 3500 rpm, and spinning is continued for a time sufficient to dry the coating. The subject process is particularly suitable for coating a substrate having nonuniform topographical features with a planarizing material.

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patent: 4281057 (1981-07-01), Castellani et al.
patent: 4385083 (1983-05-01), Shelley
patent: 4451507 (1984-05-01), Beltz et al.
patent: 4510176 (1985-04-01), Cuthbert et al.
Chivers, Preprints of Kodak Microelectronics Seminar, Interface '84, pp. 44-51.
White, SPIE vol. 539, Advances in Resist Technology and Processing II, pp. 29-35, 1985.
White et al., J. Vac. Sci. Technol. B, vol. 3, No. 3, pp. 862-868, 1985.

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