Coating apparatus – With means to centrifuge work – Reciprocating centrifuge
Patent
1991-03-14
1993-04-27
Jones, W. Gary
Coating apparatus
With means to centrifuge work
Reciprocating centrifuge
118 52, 118 53, 118 56, 164 46, B05C 1102
Patent
active
052058670
ABSTRACT:
A semiconductor wafer 11 is mounted on an elongated member 18, one end of which is rotatable about a transverse axis (14), thereby to distribute a liquid on the upper surface of the wafer more evenly. In order to stabilize the rotation of the elongated member, a second elongated member is preferably attached end-to-end to the elongated member (18) and rotates with it. A counterweight (26) in the second elongated member moves during the rotation such that the distance between the wafer and the central axis and the distance between the center of the counterweight and the axis are substantially equal. The weight distribution is approximately symmetrical about the axis and the structure is dynamically stabilized. The counterweight and the wafer assembly may be moved during rotation by applying air pressure from a source (23) to pistons (13,26) in the two elongated member.
REFERENCES:
patent: 3834613 (1974-09-01), Hankey
patent: 4267212 (1981-05-01), Sakawaki
patent: 4295444 (1981-10-01), Hatta et al.
patent: 4457259 (1984-07-01), Samuels
patent: 4989345 (1991-02-01), Gill, Jr.
patent: 4995331 (1991-02-01), Voit
patent: 5042421 (1991-08-01), Anbe
Anderson R. B.
AT&T Bell Laboratories
Burns Todd J.
Jones W. Gary
LandOfFree
Spin coating apparatus having a horizontally linearly movable wa does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Spin coating apparatus having a horizontally linearly movable wa, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Spin coating apparatus having a horizontally linearly movable wa will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2324215