Spin coating apparatus for film formation over substrate

Coating processes – Centrifugal force utilized

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118 50, 118 52, 427294, 427377, 427378, 4273855, B05D 312

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active

053956494

ABSTRACT:
A method and apparatus for rotating a substrate having a liquid material placed thereon to coat the liquid material over the substrate. A plate member is positioned at a predetermined height above the substrate to minimize the growth of the fluid flows produced above the substrate due to rotation of the substrate.

REFERENCES:
patent: 2580131 (1951-12-01), Rowell
patent: 4347302 (1982-08-01), Gotman
patent: 4393807 (1983-07-01), Fujimura et al.
patent: 4790262 (1988-12-01), Nakayama et al.
patent: 4889069 (1989-12-01), Kawakami
I.B.M. Technical Disclosure Bulletin, vol. 22, No. 5, Oct. 1979.
I.B.M. Technical Disclosure Bulletin, vol. 17, No. 11, Apr. 1975.

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