Spin-coating apparatus and coated substrates prepared using...

Details Spin-coating apparatus and coated substrates prepared using... Spin-coating apparatus and coated substrates prepared using...

2005-12-09

2009-12-15

Tadesse, Yewebdar T (Department: 1792)

Coating apparatus

With means to centrifuge work

C118S500000, C118S503000, C118S612000, C118S320000, C428S064100, C428S064600, C428S620000

Reexamination Certificate

active

07632352

ABSTRACT:
Provided is a spin coating apparatus having a ring-shaped or polygonal auxiliary member for use in manufacture of a coated substrate via spin coating, wherein the auxiliary member is positioned adjacent to the side of a substrate for coating, within a range of a spaced distance of 0.03 to 0.8 mm and a range of a height deviation of less than 0.1 mm, upon mounting the substrate.When a surface of a substrate for coating is spin coated with a coating agent using the apparatus of the present invention, it is possible to eliminate or effectively reduce a ski-jump phenomenon at end portions of a coated substrate occurring when spin coating is performed, thereby resulting in uniform coating of a coating solution on the substrate, and it is also possible to effectively decrease contamination of the substrate for coating due to inflow or stay of the remaining coating agent.

REFERENCES:
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patent: 6533864 (2003-03-01), Matsuyama et al.
patent: 6540869 (2003-04-01), Saeki et al.
patent: 2005/0039675 (2005-02-01), Kang et al.
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patent: 2003-0004541 (2003-01-01), None
patent: 2005-0023038 (2005-03-01), None

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