Coating apparatus – Projection or spray type – Rotating turret work support
Patent
1995-12-22
1999-02-02
Simmons, David A.
Coating apparatus
Projection or spray type
Rotating turret work support
118712, 118 52, B05A 1302, B05C 1102
Patent
active
058658939
ABSTRACT:
Uneconomical use of resist liquid is prevented by reducing resist liquid discharging time. Discharging time calculating means calculates a proper resist liquid discharging time, based on a first and a second rotation angular speeds of a supporting pedestal and a discharged flow quantity discharged from resist liquid discharging nozzle per unit time. When the proper resist liquid discharging time has elapsed from the start of discharging of the resist liquid by means of a pump, discharging of the resist liquid is stopped.
REFERENCES:
patent: 4451507 (1984-05-01), Beltz et al.
patent: 5439519 (1995-08-01), Sago et al.
Matsunaga Minobu
Mimasaka Masahiro
Mizobata Ikuo
Dainippon Screen Mfg. Co,. Ltd.
Padgett Calvin
Simmons David A.
LandOfFree
Spin coating apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Spin coating apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Spin coating apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1113124